Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1985-08-08
1987-06-23
Niebling, John F.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
2041828, B01D 5702, G01N 2726
Patent
active
046750959
ABSTRACT:
An electrophoretic apparatus according to this invention comprises electrophoretic paths along which sample fragments labeled with phosphor migrate; electrodes disposed at both the ends of said electrophoretic paths; a driving power source for giving said sample fragments on the electrophoretic paths electrophoretic force by applying an electric potential difference between said electrodes; an excitation light source projecting an excitation light to said sample fragments on said electrophoretic paths; and means for detecting fluorescence emitted by the phosphor existing in the sample fragments and excited by the excitation light. Said an excitation light source is so disposed that the excitation light is projected to said sample fragments on said electrophoretic paths in a direction substantially parallel to a plane containing said electrophoretic paths.
REFERENCES:
patent: 3793180 (1974-02-01), Flower et al.
patent: 3870612 (1975-03-01), Flygare et al.
patent: 4011044 (1977-03-01), Uzgiris
patent: 4046667 (1977-09-01), Goetz
patent: 4113596 (1978-09-01), Treille et al.
Maxam-Gilbert, DNA (Protein.Nucleic Acid.Enzyme) vol. 23, No. 3 (1978) pp. 182-196.
Kambara Hideki
Simada Tamotu
Tokita Jirou
Watanabe Ken'ichi
Hitachi , Ltd.
Niebling John F.
Starsiak Jr. John S.
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