Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1990-04-05
1991-09-24
Tung, T.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
2041828, 2504581, 2504611, 2504612, 356344, G01N 2726
Patent
active
050511629
ABSTRACT:
A fluorescence detection type electrophoresis apparatus comprising an excitation laser beam source (1, 29), fluorescent light detector portion, and electrophoresis separation device which can measure many samples at the same time in such a way that it has a plurality of slab gels (4, 23) being provided in parallel and a fluorescent light detector (8, 32) installed in position where it can individually and simultaneously receive and detect fluorescent lights coming out of migration direction lower ends (16, 40) of the slab gels (4, 23) or of portions adjacent thereto. It is preferable that the fluorescence detection type electrophoresis apparatus has a plurality of slab gels (4, 23) integrated together via gel supporting plates (22). For this, a supporting vessel for use with the fluorescence detection type electrophoresis apparatus can be used for effective preparation of numbers of slab gels (4, 23), in which a plurality of vertically oriented gel supporting plates (22) is arranged at predetermined intervals on the bottom thereof.
REFERENCES:
patent: 3980540 (1976-09-01), Hoefer
patent: 4325796 (1982-04-01), Hoefer et al.
patent: 4832815 (1989-05-01), Kambara et al.
patent: 4881812 (1989-11-01), Ohkubo et al.
"Nature", vol. 321, pp. 674-679 (1986).
"Bio/Technology", vol. 6, pp. 816-821 (1988).
Kambara Hideki
Nagai Keiichi
Hitachi , Ltd.
Ryser David G.
Tung T.
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