Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1993-04-12
1994-03-01
Niebling, John
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
2041828, 356344, G01N 2726, G01N 27447
Patent
active
052904199
ABSTRACT:
In the multi-color fluorescence detection type electrophoresis apparatus provided with the electrophoresis gel plate, excitation laser source, means to separate the fluorescence images according to each emission wavelength, and the detector of the fluorescence subjected to wavelength selection, two or more laser sources are provided, each of laser lights is irradiated on the sample on a time-sharing basis, and the filter which cuts off the scattered light of each the laser synchronous with the laser beam is installed in front of the wavelength separation means thereby providing simultaneous, quick and real-time analysis of a great number of samples such as DNA and RNA labeled by many types of fluorophores, without overlapping the wavelengths of the excitation light and the fluorescence.
REFERENCES:
patent: 4832815 (1989-05-01), Kambara et al.
patent: 5062942 (1991-11-01), Kambara et al.
Lloyd M. Smith et al "Fluorescence detection in automated DNA sequence analysis" Nature vol. 321 (1986) 674.varies.679.
Anazawa Takashi
Kambara Hideki
Machida Hiroaki
Nagai Keiichi
Nasu Hisanori
Hitachi , Ltd.
Hitachi Electronics Engineering Co. Ltd.
Hitachi Software Engineering Co.
Niebling John
Starsiak Jr. John S.
LandOfFree
Fluorescence detection type electrophoresis apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Fluorescence detection type electrophoresis apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Fluorescence detection type electrophoresis apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-574056