Fluorene containing compounds and negative photoresist compositi

Details Fluorene containing compounds and negative photoresist compositi Fluorene containing compounds and negative photoresist compositi

1986-07-02

1987-05-05

Kittle, John E.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Polymers from only ethylenic monomers or processes of...

560220, 560221, C08F 1204, C07C 6954

Patent

active

046634126

ABSTRACT:
Polymers of fluorene containing compounds which form crosslinked networks are found to provide useful negative photoresists which are sensitive in the ultraviolet wavelength range of between about 200 nm to 300 nm. When used in negative photoresist compositions, these fluorene compounds produce a high resolution and thus higher information density in microcircuits manufactured using these photoresists.

REFERENCES:
patent: 2476737 (1949-07-01), Kern et al.
patent: 3169060 (1965-02-01), Hoegl
patent: 4098984 (1978-07-01), Turner
patent: 4122113 (1978-10-01), Turner

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