Fluidized bed silicon deposition from silane

Details Fluidized bed silicon deposition from silane Fluidized bed silicon deposition from silane

1980-03-03

1982-02-09

Silverberg, Sam

Coating apparatus

Gas or vapor deposition

Means to coat or impregnate particulate matter

422198, 427213, 427 86, 423349, C23C 1308

Patent

active

043145256

ABSTRACT:
A process and apparatus for thermally decomposing silicon containing gas for deposition on fluidized nucleating silicon seed particles is disclosed.
Silicon seed particles are produced in a secondary fluidized reactor by thermal decomposition of a silicon containing gas. The thermally produced silicon seed particles are then introduced into a primary fluidized bed reactor to form a fluidized bed. Silicon containing gas is introduced into the primary reactor where it is thermally decomposed and deposited on the fluidized silicon seed particles. Silicon seed particles having the desired amount of thermally decomposed silicon product thereon are removed from the primary fluidized reactor as ultra pure silicon product.
An apparatus for carrying out this process is also disclosed.

REFERENCES:
patent: 2915367 (1959-12-01), Olson
patent: 4207360 (1980-06-01), Padovani

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