Coating apparatus – Gas or vapor deposition – Means to coat or impregnate particulate matter
Patent
1979-10-17
1981-04-07
Kaplan, Morris
Coating apparatus
Gas or vapor deposition
Means to coat or impregnate particulate matter
118DIG5, 422143, B05C 1110, C23C 1308
Patent
active
042599253
ABSTRACT:
In a fluidized bed reactor total gas feed is through a constricted opening at the bottom of the reactor. A carrier gas supply duct communicates with said bottom. A reaction gas supply tube, disposed within said duct, has an outlet spaced from said bottom and is comprised of a bundle of tubes arranged to dispense an annular stream.
REFERENCES:
patent: 2611685 (1952-09-01), Yoder
patent: 3112220 (1963-11-01), Heiser et al.
patent: 3252823 (1966-05-01), Jacobson et al.
patent: 3398718 (1968-08-01), Pilloton
patent: 4080927 (1978-03-01), Brown
patent: 4153004 (1979-05-01), Barnert
Barnert Eike
Frommelt Wolfgang
Zimmer Erich
Kaplan Morris
Kernsforschungsanlage Julich GmbH
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