Chemical apparatus and process disinfecting – deodorizing – preser – Control element responsive to a sensed operating condition
Reexamination Certificate
2007-12-18
2007-12-18
Sines, Brian (Department: 1743)
Chemical apparatus and process disinfecting, deodorizing, preser
Control element responsive to a sensed operating condition
C422S050000, C422S068100, C422S081000, C422S082000, C422S105000, C422S105000, C422S105000, C436S043000, C436S052000, C436S053000, C436S174000, C436S177000, C436S180000
Reexamination Certificate
active
10606023
ABSTRACT:
A fluidic micro electro-mechanical system (MEMS) device is described. In one aspect, at least one at least partially covered fluidic channel is formed between a polymer layer and a polymer substrate as the polymer layer is deposited on the substrate. The partially covered fluidic channel is fabricated as a unitary polymer layer structure. In one implementation, a strong exposure process is applied to the polymer layer to create a deep cross-linked polymer region. A weak exposure process is applied to the polymer layer to create a shallow cross-linked polymer region.
REFERENCES:
patent: 5375979 (1994-12-01), Trah
patent: 2002/0098097 (2002-07-01), Singh
patent: 2002/0117517 (2002-08-01), Unger
patent: 2003/0007715 (2003-01-01), Loock
patent: 2003/0017467 (2003-01-01), Hooper
patent: 1 283 563 (2003-02-01), None
patent: WO 98/45693 (1998-10-01), None
patent: WO 01/38844 (2001-05-01), None
patent: WO 01/96958 (2001-12-01), None
patent: WO 02/43615 (2002-06-01), None
J.H.Daniel, “Silicon microchambers for DNA amplification”, Sensors and Actuators vol. 71, No. 1-2, Nov. 1, 1998, pp. 81-88.
Chen Chien-Hua
Yang Xia feng
Hewlett--Packard Development Company, L.P.
Sines Brian
LandOfFree
Fluidic MEMS device does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Fluidic MEMS device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Fluidic MEMS device will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3843615