Fluid treatment system and process

Chemical apparatus and process disinfecting – deodorizing – preser – Chemical reactor – With means applying electromagnetic wave energy or...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

422 24, 422906, B01J 1912, C02F 132

Patent

active

RE0368962

DESCRIPTION:

BRIEF SUMMARY
TECHNICAL FIELD

The present invention relates to a method of treating fluid by providing a gravity fed flow of fluid to an irradiation zone comprising at least one radiation source and having a closed cross-section which confines the flow of fluid within a predefined maximum distance from the at least one radiation source.
The present invention also relates to a novel method of cleaning a radiation source assembly located within a fluid flow wherein the exterior of the source is swept by a cleaning member containing an appropriate cleaning fluid.
The present invention also relates to a novel system for treating fluid by exposing it to radiation. Specifically, the present invention relates to a novel gravity fed system for treating fluids comprising a treatment zone which includes a irradiation zone configured to provide a fixed fluid geometry relative to the radiation sources.
The present invention also relates to a novel radiation source module for use in a fluid treatment system. Specifically, the module includes one or more radiation source assemblies connected to a support member and the support member is designed to permit insertion and extraction of the module from the treatment system while the system is in use. The module is designed such that the radiation source assembly is prevented from contacting surfaces within the treatment zone of the system while being installed or removed.
The present invention also relates to a novel cleaning apparatus for fluid treatment systems. Specifically, the cleaning apparatus includes one or more cleaning members which may be swept over the exterior of radiation source assemblies within the fluid treatment system, the cleaning members containing a suitable cleaning fluid which contacts the exterior of the radiation source assembly and loosens and/or removes materials fouling the exterior of the radiation source assembly.


BACKGROUND ART

Fluid treatment systems are known. For example, U.S. Pat. Nos. 4,482,809, 4,872,980 and 5,006,244 (assigned to the assignee of the present invention), the contents of each of which are hereby incorporated by reference, all describe gravity fed fluid treatment systems which employ ultraviolet (UV) radiation.
Such systems include an array of UV lamp frames which include several UV lamps each of which are mounted within sleeves extending between two support arms of the frames. The frames are immersed into the fluid to be treated which is then irradiated as required. The amount of radiation to which the fluid is exposed is determined by the proximity of the fluid to the lamps, the output wattage of the lamps and the fluid's flow rate past the lamps. One or more UV sensors may be employed to monitor the UV output of the lamps and the fluid level is typically controlled, to some extent, downstream of the treatment device by means of level gates or the like. Since, at higher flow [rams] rates, accurate fluid level control is difficult to achieve in gravity fed systems, fluctuations in fluid level are inevitable. Such fluctuations could lead to non-uniform irradiation in the treated fluid.
However, disadvantages exist with the above-described systems. Depending upon the quality of the fluid which is being treated, the sleeves surrounding the UV lamps periodically become fouled with foreign materials, inhibiting their ability to transmit UV radiation to the fluid. When fouled, at intervals which may be determined from historical operating data or by the measurements from the UV sensors, the sleeves must be manually cleaned to remove the fouling materials.
If the UV lamp frames are employed in an open, channel-like system, one or more of the frames may be removed while the system continues to operate, and the removed frames may be immersed in a bath of suitable acidic cleaning solution which is air-agitated to remove fouling materials. Of course, surplus or redundant sources of UV radiation must be provided (usually by including extra UV lamp frames) to ensure adequate irradiation of the fluid being treated while one or more of the frame

REFERENCES:
patent: 2189279 (1940-02-01), Bitner
patent: 2413704 (1947-01-01), Glatthar et al.
patent: 2670439 (1954-02-01), Damey
patent: 3061721 (1962-10-01), Brenner
patent: 3140054 (1964-07-01), Oharenko
patent: 3182191 (1965-05-01), McFarland et al.
patent: 3456107 (1969-07-01), Robertson
patent: 3462597 (1969-08-01), Young
patent: 3562520 (1971-02-01), Hippen
patent: 3637342 (1972-01-01), Veloz
patent: 3837800 (1974-09-01), Wood
patent: 3858048 (1974-12-01), Shand et al.
patent: 3872349 (1975-03-01), Spero et al.
patent: 3924139 (1975-12-01), Hirose et al.
patent: 3948772 (1976-04-01), Ellner
patent: 4033719 (1977-07-01), Conn et al.
patent: 4103167 (1978-07-01), Ellner
patent: 4205956 (1980-06-01), Flatow
patent: 4255663 (1981-03-01), Lewis
patent: 4296328 (1981-10-01), Regan
patent: 4336223 (1982-06-01), Hillman
patent: 4342915 (1982-08-01), Karamian
patent: 4367410 (1983-01-01), Wood
patent: 4400270 (1983-08-01), Hillman
patent: 4435744 (1984-03-01), Russo
patent: 4467206 (1984-08-01), Taylor et al.
patent: 4471225 (1984-09-01), Hillman
patent: 4482809 (1984-11-01), Maarschalkerweerd
patent: 4490777 (1984-12-01), Tanner et al.
patent: 4535247 (1985-08-01), Kurtz
patent: 4591958 (1986-05-01), Lamboo
patent: 4596935 (1986-06-01), Lumpp
patent: 4661890 (1987-04-01), Watanabe et al.
patent: 4700101 (1987-10-01), Ellner et al.
patent: 4755292 (1988-07-01), Merriam
patent: 4757205 (1988-07-01), Latel et al.
patent: 4767932 (1988-08-01), Ellner
patent: 4872980 (1989-10-01), Maarschalkerw
patent: 4896042 (1990-01-01), Humphreys
patent: 4897246 (1990-01-01), Peterson
patent: 4904874 (1990-02-01), Ellner
patent: 4922114 (1990-05-01), Boehme
patent: 4952369 (1990-08-01), Belilos
patent: 4952376 (1990-08-01), Peterson
patent: 4968489 (1990-11-01), Peterson
patent: 4968891 (1990-11-01), Jhawar et al.
patent: 4981651 (1991-01-01), Horng
patent: 5006244 (1991-04-01), Maarschalkerw
patent: 5019256 (1991-05-01), Ifill et al.
patent: 5043080 (1991-08-01), Cater et al.
patent: 5124131 (1992-06-01), Wekhof
patent: 5227140 (1993-07-01), Hager et al.
patent: 5266211 (1993-11-01), Breuker et al.
patent: 5266215 (1993-11-01), Engelhard
patent: 5332388 (1994-07-01), Schuerch et al.
patent: 5418370 (1995-05-01), Maarschalkerweerd
patent: 5624573 (1997-04-01), Wiesmann
"Ultraviolet Systems Prove Their Germ-Fighting Merit", D. Hodges, reprinted from Florida Specifier, Apr. 1994.
"The UV Effect on Wastewater", R. Fahey, Water/Engineering & Management, Dec. 1990.
"UV Disinfection At The Northfield Water Pollution Control Plant A Case History", G. Lindroos and O. Karl Scheible.
"Hydraulic And Microbiological Characterization Of Reactors For Ultraviolet Disinfection Of Secondary Wastewater Effluent", by Th.J. Nieuwstad, et al., Wat. Res. vol. 25, No. 7, pp. 775-783, 1991.
"Municipal Wastewater Disinfection", Design Manual, EPA/625/1-86/021, Oct. 1986.
"Ultraviolet Treatment Of Secondary Wastewater Effluent: An Interim Report", George Baer, Public Works, Feb. 1979.
Calgon Carbon Motion, Sep. 7, 1999.
Die Katadyn UV-Verfahrer zur Keimreduktior im Abwassen, Office National de la Propriete Industrielle, 1.sup.st Addition, Au Brevet d'Invention Sketch of UVPS System Allegedly Installed in Lebanon, Mo. WWTP, Jul. 1988.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Fluid treatment system and process does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Fluid treatment system and process, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Fluid treatment system and process will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-183647

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.