Fluid treatment system and cleaning apparatus therefor

Cleaning and liquid contact with solids – Apparatus – Sequential work treating receptacles or stations with means...

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C134S170000, C134S181000, C134S12200P

Reexamination Certificate

active

06863078

ABSTRACT:
A cleaning apparatus (10) for a radiation source assembly (35) in a fluid treatment system is described. The cleaning apparatus comprise cleaning chamber (20) and a second chamber (25, 30) independent of the cleaning chamber which defines a fluid (typically water) buffer layer to obviate or mitigate cleaning fluid from the cleaning chamber leaking into the fluid being treated. The fluid treatment system is particularly useful for us in clean water applications in which ultraviolet radiation is used to treat the water while having the advantages of in situ cleaning of the radiation source when it becomes fouled.

REFERENCES:
patent: 3365740 (1968-01-01), Hunt et al.
patent: 5227140 (1993-07-01), Hager et al.
patent: 5295278 (1994-03-01), Condon et al.
patent: 5440131 (1995-08-01), Hutchison et al.
patent: 5501843 (1996-03-01), Peterson
patent: 5505912 (1996-04-01), Hallett
patent: 5590390 (1996-12-01), Maarschalkerweerd
patent: 5874740 (1999-02-01), Ishiyama
patent: 5937266 (1999-08-01), Kadoya
patent: 6231820 (2001-05-01), Wedekamp
patent: 6303087 (2001-10-01), Wedekamp
patent: 6315963 (2001-11-01), Speer
patent: 0743105 (1996-11-01), None
patent: 55-129104 (1980-10-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Fluid treatment system and cleaning apparatus therefor does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Fluid treatment system and cleaning apparatus therefor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Fluid treatment system and cleaning apparatus therefor will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3387539

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.