Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...
Patent
1997-06-30
1999-03-02
Soderquist, Arlen
Cleaning and liquid contact with solids
Processes
Including application of electrical radiant or wave energy...
134 1, 134184, B08B 312
Patent
active
058765077
ABSTRACT:
A fluid treating device with at least one chamber, a plurality of ultrasonic transducers for imparting ultrasonic waves through fluid when present in the at least one chamber; a screen located in the at least one chamber wherein the screen is coated with a dielectric material. The coated screen diffuses the ultrasonic waves and enhances uniform treatment. The fluid treating device is useful for treatments such as cleaning, degreasing, plating or etching articles such as ceramic substrates.
REFERENCES:
patent: 2702260 (1955-02-01), Massa
patent: 2828231 (1958-03-01), Henry
patent: 2985003 (1961-05-01), Gelfand et al.
patent: 3229702 (1966-01-01), Murdoch, Jr.
patent: 3448747 (1969-06-01), Isaacson
patent: 3937236 (1976-02-01), Runnells
patent: 4131438 (1978-12-01), Iwahashi et al.
patent: 4854337 (1989-08-01), Bunkenburg et al.
patent: 5143106 (1992-09-01), Bannon
patent: 5377709 (1995-01-01), Shibano
patent: 5427622 (1995-06-01), Stanasolovich et al.
patent: 5456759 (1995-10-01), Stanford, Jr. et al.
patent: 5512335 (1996-04-01), Miller et al.
(Problems 10.20,10.21) "Intensity Distribution for Interferences with Diffraction from N Identical Slits".
Bajkowski David John
Brown Mark Alan
Cole Richard Emerson
Potsko Daniel Stephen
Fraley Lawrence R.
International Business Machines - Corporation
Soderquist Arlen
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