Fluid heater for semiconductor device

Electric resistance heating devices – Heating devices – Continuous flow type fluid heater

Patent

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Details

392485, 392492, 392493, F24H 110

Patent

active

061448028

ABSTRACT:
A fluid heater for a semiconductor device is provided to uniformly heat a gas, for thereby improving uniformity and speed of gas reaction and thus increasing the yield of semiconductor device fabrication. The fluid heater includes a main heater of a helical shape formed of a thermal conductor having various radii; a transparent tube, in which the main heater is located, having a plurality of holes at a lower portion thereof; an internal vessel disposed at an outer side of the transparent tube and having a plurality of holes at an upper portion thereof; an external vessel located at an outer side of the internal vessel; flanges placed on the external vessel, the internal vessel and the transparent tube and connecting a fluid inflow tube and the transparent tube and an external heater disposed at an outer wall of the external vessel. Here, the main heater is fabricated in a helical shape which has various radii, so that the fluid is evenly heated by a vortex generated by which the fluid passes through the main heater and also the fluid is heated by direct contact with the heater, thereby having an effect of increasing a temperature of the fluid up to a sufficiently high temperature, for example, a temperature above 600.degree. C.

REFERENCES:
patent: 1519395 (1924-12-01), Clench
patent: 1767122 (1930-06-01), Dean
patent: 3560710 (1971-02-01), Fuellemann
patent: 5445699 (1995-08-01), Kamikawa et al.
patent: 5595606 (1997-01-01), Fujikawa et al.
patent: 5930458 (1999-07-01), Yane et al.

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