Fluid handling apparatus

Chemical apparatus and process disinfecting – deodorizing – preser – Chemical reactor – Including solid – extended surface – fluid contact reaction...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

422218, 422222, 55523, B01J 0802

Patent

active

052830500

ABSTRACT:
An integrated reactor is capable of mixing, reacting, and/or sparging two or more fluids. The reactor is preferably formed of a porous element and a housing formed of at least two inlets and an outlet. A catalyst may be incorporated into the porous element.

REFERENCES:
patent: 1685759 (1928-09-01), Walter
patent: 1959151 (1934-05-01), Beekley
patent: 2363738 (1944-11-01), Mather et al.
patent: 2835560 (1958-05-01), Bason et al.
patent: 2997374 (1961-08-01), Lavender, Jr. et al.
patent: 3073684 (1963-01-01), Williams, Sr.
patent: 3167399 (1965-01-01), Hansen, Jr.
patent: 3567400 (1971-03-01), Shah
patent: 3736105 (1973-05-01), Tourtellotte et al.
patent: 3895919 (1975-07-01), Forster et al.
patent: 4141830 (1979-02-01), Last
patent: 4392817 (1983-07-01), Berlie et al.
patent: 4707341 (1987-11-01), Koch et al.
patent: 4780287 (1988-12-01), Zeff et al.
patent: 4829766 (1989-05-01), Hankel
patent: 4830833 (1989-05-01), Shaff
patent: 4859425 (1989-08-01), Zardi
patent: 4954320 (1990-09-01), Birmingham et al.
patent: 4956152 (1990-09-01), Keough et al.
patent: 4971771 (1990-11-01), Stahl
patent: 4976928 (1990-12-01), Foster et al.
patent: 4990311 (1991-02-01), Hirai et al.
patent: 5112578 (1992-05-01), Murayama et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Fluid handling apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Fluid handling apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Fluid handling apparatus will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-578187

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.