Fluid flow control process

Gas and liquid contact apparatus – Contact devices – Injector type

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Details

75 93E, 137 3, 239 8, 261DIG65, 261 782, B01F 304

Patent

active

046345590

ABSTRACT:
A method is disclosed for controlling flow rates of a primary fluid including aspirating, mixing, and metering the primary fluid with a secondary fluid. The secondary fluid has a high relative vapor pressure to form a gaseous mixture consisting essentially of vapor at constant volume fraction of primary fluid independent of flow rates. In one aspect, the invention includes passing a secondary fluid of diluent gas through a venturi having specified proportions including discharge coefficient; and pumping primary fluid through venturi suction to pass through a primary fluid orifice of specified discharge coefficient wherein the venturi discharge coefficients of the venturi and the liquid orifice form a substantially linear proportionality over a wide range of flow rates through the venturi.

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