Fluid flow control method and apparatus for minimizing particle

Fluent material handling – with receiver or receiver coacting mea – Processes – Gas or variation of gaseous condition in receiver

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141 4, 137 14, G05D 1600, F16K 2404

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active

052400468

ABSTRACT:
A fluid flow control for use with a process chamber. In the disclosed embodiment, the process chamber is for ion implantation of a workpiece and the fluid flow control is to assure the flow rates are maintained at values which are efficient in evacuating and pressurizing the chamber but are not high enough to dislodge particulate contaminants from the process chamber walls. In the disclosed design, the invention has utility both in instances in which wafers are directly inserted into the process chamber for ion implantation and in which the wafers are inserted into the chamber by use of a load-lock which avoids the requirement that the process chamber be cyclicly pressurized and depressurized.

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patent: 4690163 (1987-09-01), Steinemann
patent: 4739787 (1988-04-01), Stoltenberg
patent: 4836233 (1989-06-01), Milgate, III
patent: 4936340 (1990-06-01), Potter et al.

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