Brakes – Internal-resistance motion retarder – With means compensating for change in temperature or viscosity
Patent
1986-05-09
1988-02-23
Butler, Douglas C.
Brakes
Internal-resistance motion retarder
With means compensating for change in temperature or viscosity
18832214, 236 93R, F16F 952
Patent
active
047264527
ABSTRACT:
A shock absorbing mechanism has a fluid filled pressure chamber with a piston mounted therein along with a restrictive orifice leading to an outer chamber. When shock is transmitted by the piston, fluid is forced through the opening against compressed gas contained in the outer chamber. The opening is formed in a movably mounted valve element normally biased against a valve seat but which is forced away from the valve seat by the fluid which had previously passed through the orifice after the force caused by the shock is abated. The size of the orifice in the valve element is controlled by a thermostatic coil mounted on the valve element. The coil is connected to a pin which pivots as the coil expands or contracts due to changes in temperature causing a flag mounted on the pin to slide over the surface of the valve element in which the orifice is formed.
REFERENCES:
patent: 1486381 (1924-03-01), Jaenichen
patent: 1798431 (1931-03-01), McWilliams
patent: 1806530 (1931-05-01), Giesler
patent: 2723006 (1955-11-01), Wyeth
patent: 3006441 (1961-10-01), Bliven et al.
patent: 3674120 (1972-07-01), Johnson
patent: 3913170 (1975-10-01), Nakane et al.
patent: 4010829 (1977-03-01), Naito et al.
patent: 4428464 (1984-01-01), Miura
McDermott Gerald L.
Ty Henry
White Alfred J.
Butler Douglas C.
Haug John A.
McAndrews James P.
Sharp Melvin
Texas Instruments Incorporated
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