Fluid delivery system using an optical sensor to monitor for gas

Dispensing – Automatic control

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222 1, 118 52, 118319, 118320, B05C 500

Patent

active

060242493

ABSTRACT:
The present invention provides a fluid delivery system for delivering fluid for a semiconductor manufacturing operation using a sensor to monitor fluid flow and stop fluid flow when gas bubbles or uneven fluid flow occurs. The system comprises: a fluid container 10 connected to a pressurized gas supply 18 by a gas supply tube 17; the fluid container 10 connected to a fluid feed tube 16; the fluid container 10 partially filled with a fluid 12; the fluid feed tube 16 having an inlet end 16A and an outlet end 40; a stop valve 20 connected in the fluid feed tube 16 between the fluid container 10 and the outlet end 40; an optical sensor 30 connected to the fluid feed tube 16; a control computer 39 for actuating the stop valve based on the analysis of the fluid by the optical sensor. The fluid flows from the fluid container 10 onto the wafer 50. The optical sensor 30 monitors the flow of the fluid and stops the flow of fluid when the fluid flowing past the optical sensor 30 contains gas bubbles or flows unevenly.

REFERENCES:
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patent: 4700870 (1987-10-01), Schleicher et al.
patent: 4857750 (1989-08-01), Millis et al.
patent: 4881487 (1989-11-01), Moore
patent: 5054650 (1991-10-01), Price
patent: 5493922 (1996-02-01), Ramey et al.
patent: 5565034 (1996-10-01), Nanbu et al.

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