Coating apparatus – Control means responsive to a randomly occurring sensed...
Patent
1993-10-29
1996-07-09
Edwards, Laura
Coating apparatus
Control means responsive to a randomly occurring sensed...
118689, 118690, 118691, 118712, 118715, 118728, B05C 500
Patent
active
055340660
ABSTRACT:
An apparatus for processing a layer on a workpiece includes a source of reactant fluid, a reaction chamber having a support for the workpiece and a fluid delivery apparatus for feeding an input fluid into the reaction chamber with the input fluid being utilized to process the material. An infrared sensor is adapted to cooperate with the fluid delivery apparatus for sensing the concentration of a component of the input fluid. The infrared sensor includes an infrared light source positioned to direct a beam of infrared light at an infrared light detector through the input fluid. The infrared light detector produces an electrical output signal indicative of the amount of light received by the detector and therefore not absorbed by the input fluid.
REFERENCES:
patent: 3654109 (1972-04-01), Hoel et al.
patent: 3734620 (1973-05-01), Cade
patent: 3808436 (1974-04-01), Risgin et al.
patent: 3877812 (1975-04-01), Thompson
patent: 4049352 (1977-09-01), Lardon
patent: 4100310 (1978-07-01), Ura et al.
patent: 4205913 (1980-06-01), Ehrfeld et al.
patent: 4264209 (1981-04-01), Buensten
patent: 4388342 (1983-06-01), Suzuki et al.
patent: 4471351 (1984-09-01), Anderson
patent: 4478173 (1984-10-01), Doehler
patent: 4515443 (1985-05-01), Bly
patent: 4553032 (1985-11-01), Lo et al.
patent: 4849259 (1989-07-01), Biro et al.
patent: 4850697 (1989-07-01), Schoennauer et al.
patent: 4888199 (1989-12-01), Felts et al.
patent: 5032435 (1991-07-01), Biefeld et al.
patent: 5073232 (1991-12-01), Ohmi et al.
patent: 5101764 (1992-04-01), Loewenstein et al.
patent: 5166747 (1992-11-01), Schroeder et al.
patent: 5202560 (1993-04-01), Koch et al.
patent: 5224441 (1993-07-01), Felts et al.
patent: 5285071 (1994-02-01), La Count
patent: 5298749 (1994-03-01), Inushima
patent: 5339155 (1994-08-01), Partridge et al.
Patent Abstracts of Japan, vol. 9, No. 108 (C-280.sub.-- 11 May 1985 & JP-A-60 002 667 (Kokusai Denki) 8 Jan. 1985 (Abstract).
Patent Abstracts of Japan, vol. 4, No. 1, (E-163) 8 Jan. 1980 & JP-A-54 141 194 (Fujitsu) 11 Feb. 1979 (Abstract).
Advances in Instrumentation and Control, vol. 44, No. 1, 1989, Research Triangle Park, U.S. pp. 325-329, T. M. Cardis "Continuous composition measurements with a new process photometer" (Abstract).
Technisches Messen TM, vol. 58, No. 12, Dec. 1991, Munchen De, pp. 490-494, J. Staab "Industrielle Gasanalyse".
Journal of Crystal Growth 77 (1986) 163-171 North-Holland Amsterdam by J. E. Butler, et al., entitled "In Situ, Real-Time Diagnostics of OMVPE Using Ir-Diode Laser Spectroscopypy".
Journal of Crystal Growth 77 (1986) 73-78 North-Holland Amsterdam by R. S. Sillmon, et al., entitled "An Ultra-Fast Gas Delivery System for Producing Abrupt Compositional Switching in OMVPE".
J. Vas. Sci. Technol. A3(6), Nov./Dec. 1985, pp. 2205-2208 by E. M. van Veldhuizen, et al., entitled "Absolute Densities of Reaction Products from Plasma Etching of Quartz".
"Paper presented at the Fifth Symposium on Ion sources and Ion-assisted Technology and International Workshop on Ion-based Techniques for film Formation, Tokyo and Kyoto, Japan, Jun. 1-5, 1981. by J. Nishizawa, et al., entitled In Situ Observation of Plasmas for Dry Etching by IR Spectroscopy and Probe Methods*", pp. 189-198.
Chapple-Sokol Jonathan D.
Conti Richard A.
Cotler Tina J.
O'Neill James A.
Passow Michael L.
Ahsan Aziz M.
Edwards Laura
Huberfeld Harold
International Business Machines - Corporation
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