Flowthrough electrochemical hemodialysate regeneration

Details Flowthrough electrochemical hemodialysate regeneration Flowthrough electrochemical hemodialysate regeneration

1982-09-22

1984-09-25

Sadowski, David R.

Chemistry: electrical and wave energy

Processes and products

Electrostatic field or electrical discharge

204128, 204129, 210648, 210748, C25B 126

Patent

active

044734492

ABSTRACT:
An improved method and electrolytic cell for the oxidation of nitrogen-containing waste materials in a dialysate stream used for hemodialysis, hemofiltration or peritoneal dialysis comprises a cylinder having a porous anode and a porous cathode spaced apart in the direction of flow. By flowing the spent dialysate in the direction from the anode to the cathode, and applying sufficient voltage to oxidize chloride ion present to activated chlorine, the waste materials are oxidized to chlorinated intermediates. In the vicinity of the cathode, the chlorinated intermediates react further to yield to nitrogen and carbon dioxide, with the chlorine being reduced back to chloride ion. In this way, the dialysate is regenerated without the net evolution of undesirable chlorine species.

REFERENCES:
patent: 3157468 (1964-11-01), Kennedy et al.
patent: 3617545 (1971-11-01), Dubois
patent: 3878564 (1975-04-01), Yao et al.
patent: 3909377 (1975-09-01), Bizot et al.
patent: 3930982 (1976-01-01), Batha et al.
patent: 3994799 (1976-11-01), Yao et al.
patent: 4347110 (1982-08-01), Joyce et al.
patent: 4388163 (1983-06-01), Richter et al.

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