Flow-through ion beam source

Details Flow-through ion beam source Flow-through ion beam source

1996-05-31

1997-02-11

Breneman, R. Bruce

Coating apparatus

Gas or vapor deposition

With treating means

156345, 1566431, C23C 1600

Patent

active

056016549

ABSTRACT:
A method and an apparatus for forming a charge neutral ion beam which is useful in producing thin films of material on electrically conductive or non-conductive substrates are provided.

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Kaufman, Harold R., "Technology of Ion Beam Sources Used in Sputtering," Journal of Vacuum Science Technology, 15(2) Mar./Apr. 1978, pp. 272-276.
Singer, Peter, ed., "Filling Contacts and Vias: A Progress Report," Semiconductor International, Feb. 1996, pp. 89-94.
Rossnagel, S. M., "Ionized Magnetron Sputtering for Lining and Filling Trenches and Vias," Semiconductor International, Feb. 1996, pp. 99-102.

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