Surgery – Blood drawn and replaced or treated and returned to body
Patent
1996-03-14
1997-10-14
Bockelman, Mark
Surgery
Blood drawn and replaced or treated and returned to body
604 20, A61M 3700
Patent
active
056766467
ABSTRACT:
A flow through apparatus for implanting molecules into living blood cells of a patient, comprises a housing including an elongated flow through chamber having an inlet and an outlet at opposite ends thereof, a pair of elongated spaced apart parallel electrodes disposed between the inlet and the outlet for fluid to flow therebetween, a continuous flow shunt including a pump for withdrawing blood from a patient, passing it through the flow through chamber between the electrodes and returning it to the patient, apparatus for injecting a predetermined quantity of fluid medium carrying preselected molecules into the blood after it has been drawn from the patient and before it passes through said chamber, and an electrical source for applying a predetermined electric signal of a predetermined amplitude and duration to the electrodes for generating and repeatedly applying electric fields of a predetermined amplitude and duration to the flow of the mixture of blood and fluid medium in order to make the walls of preselected cells in the blood transiently permeable to permit molecules to enter the preselected cells without killing the cells.
REFERENCES:
patent: 4464166 (1984-08-01), Edelson
patent: 4496443 (1985-01-01), Mack et al.
patent: 4612007 (1986-09-01), Edelson
patent: 4849089 (1989-07-01), Marshall, III
patent: 5098843 (1992-03-01), Calvin
patent: 5501662 (1996-03-01), Hofmann
Hofmann Gunter A.
Kent Henry R.
Bockelman Mark
Genetronics Inc.
LandOfFree
Flow through electroporation apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Flow through electroporation apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Flow through electroporation apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1551485