Coating apparatus – Gas or vapor deposition
Patent
1996-09-06
1998-12-22
Breneman, Bruce
Coating apparatus
Gas or vapor deposition
95 22, 96243, 96355, C23C 1600
Patent
active
058512934
ABSTRACT:
A flow stabilization system for damping pressure variations in a process discharging an effluent gas stream, in which the process is pressure-sensitive and downstream pressure variations can adversely affect the upstream process, said system comprising a motive fluid driver constructed and arranged to receive the effluent gas stream from the process, and means for sensing a flow characteristic of the effluent gas stream and responsively adjusting the flow of the effluent gas stream to damp pressure fluctuations in the process. The flow stabilization system may further comprise: (i) a variable frequency drive for motively operating the motive fluid driver at a correspondingly variable rotational speed; (ii) a pressure transducer monitor for monitoring the flow characteristic of the effluent gas stream and generating a pressure transduced signal; and (iii) a proportional integral derivative controller coupled in pressure transduced signal-receiving relationship with the pressure transducer monitor, and responsive to the pressure transduced signal to correspondingly adjust the variable frequency drive and responsively selectively drive the motive fluid driver to damp pressure fluctuations in the process. The system has applicability to stabilizing pressure-sensitive processes such as vapor phase coating and reaction processes in semiconductor manufacturing.
REFERENCES:
patent: 4118149 (1978-10-01), Hagberg
patent: 4728869 (1988-03-01), Johnson et al.
patent: 4834020 (1989-05-01), Bartholomew et al.
patent: 4910042 (1990-03-01), Hokynar
patent: 4958658 (1990-09-01), Zajac
patent: 4993358 (1991-02-01), Mahawili
patent: 5011520 (1991-04-01), Carr et al.
patent: 5088922 (1992-02-01), Kakizaki
patent: 5113789 (1992-05-01), Kamian
patent: 5118286 (1992-06-01), Sarin
patent: 5136975 (1992-08-01), Bartholomew et al.
patent: 5199853 (1993-04-01), Padden
patent: 5211729 (1993-05-01), Sherman
patent: 5240380 (1993-08-01), Mabe
patent: 5250092 (1993-10-01), Nakano
patent: 5271427 (1993-12-01), Berchem
patent: 5361800 (1994-11-01), Ewing
patent: 5450873 (1995-09-01), Palmer
patent: 5518696 (1996-05-01), Jain
patent: 5681368 (1997-10-01), Rahimzadeh
patent: 5707451 (1998-01-01), Robles et al.
McCabe et al, Unit Operations of Chemical Engineering, pp. 225-229, 1967.
Colman Ronald
Heading Liam R.
Lane Scott
Shah Dinesh
Simpson Eric
ATMI Ecosys Corporation
Breneman Bruce
Hultquist Steven J.
Lund Jeffrie R
Zitzmann Oliver A.M.
LandOfFree
Flow-stabilized wet scrubber system for treatment of process gas does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Flow-stabilized wet scrubber system for treatment of process gas, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Flow-stabilized wet scrubber system for treatment of process gas will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2041916