Measuring and testing – Gas analysis – Moisture content or vapor pressure
Patent
1995-06-15
1997-04-01
Williams, Hezron E.
Measuring and testing
Gas analysis
Moisture content or vapor pressure
7386481, G01N 700
Patent
active
056168276
ABSTRACT:
A flow manifold for high purity analyzers is described, in which all flow control valving is positioned downstream of the measurement device. Specifically, this new flow manifold is applied to a high purity moisture analyzer that utilizes a quartz crystal microbalance detector. The proposed flow design eliminates outgassing and contamination from upstream valving, deadlegs in the flow path, and significantly improves instrument response speed. Experimental data is provided to confirm the performance advantage of the new manifold design over existing designs.
REFERENCES:
patent: 2830945 (1958-04-01), Keidel
patent: 3001918 (1961-09-01), Czuha, Jr.
patent: 3327519 (1967-06-01), Crawford
patent: 3329004 (1967-07-01), King, Jr.
patent: 3511080 (1970-05-01), Roof
patent: 3800593 (1974-04-01), Bradley
patent: 5010776 (1991-04-01), Lucero et al.
patent: 5198094 (1993-03-01), Mettes
patent: 5259233 (1993-11-01), Brandt
patent: 5343735 (1994-09-01), Succi et al.
patent: 5351120 (1994-09-01), Jurcik et al.
patent: 5379629 (1995-01-01), Muller
Bear, Jr. Robert S.
Blakemore Colin B.
Dell Curtis G.
Golod Anatoly
Peterson Douglas
Ametek Inc.
Politzer Jay L.
Williams Hezron E.
LandOfFree
Flow manifold for high purity analyzers does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Flow manifold for high purity analyzers, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Flow manifold for high purity analyzers will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-540888