Flow-fill structures

Details Flow-fill structures Flow-fill structures

2006-10-03

2006-10-03

Santiago, Mariceli (Department: 2879)

Electric lamp and discharge devices

With support and/or spacing structure for electrode and/or...

Supporting and/or spacing elements

C313S495000, C445S024000

Reexamination Certificate

active

07116042

ABSTRACT:
A preferred embodiment of the invention is directed to support structures such as spacers used to provide a uniform distance between two layers of a device. In accordance with a preferred embodiment, the spacers may be formed utilizing flow-fill deposition of a wet film in the form of a precursor such as silicon dioxide. Formation of spacers in this manner provides a homogenous amorphous support structure that may be used to provide necessary spacing between layers of a device such as a flat panel display.

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Gaillard et al., “Silicon Dioxide Chemical Vapor Deposition Using Silane and Hydrogen Peroxide”,J. Vac. Sci. Technol., B 14(4), Jul./Aug. 1996.

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