Flow control of photo-polymerizable resin

Semiconductor device manufacturing: process – Miscellaneous

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C430S298000

Reexamination Certificate

active

07932190

ABSTRACT:
This invention provides methods and systems, e.g., to control the flow of photo-polymerizable resins. In the method, e.g., flow of a photo-polymerizable resin is restricted from illuminated resin exclusion regions on a substrate surface by precisely situated flow barriers. A system to control photo-polymerizable resin flow includes, e.g., a light source, a mask and a substrate.

REFERENCES:
patent: 5089111 (1992-02-01), Zhu et al.
patent: 5164055 (1992-11-01), Dubrow
patent: 5304487 (1994-04-01), Wilding et al.
patent: 5336585 (1994-08-01), Takahashi et al.
patent: 5409863 (1995-04-01), Newman
patent: 5545302 (1996-08-01), Zhu et al.
patent: 6042710 (2000-03-01), Dubrow
patent: 6084311 (2000-07-01), Jiang et al.
patent: 6139661 (2000-10-01), Cronin et al.
patent: 2002/0012971 (2002-01-01), Mehta
U.S. Appl. No 09/993,914, Chien et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Flow control of photo-polymerizable resin does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Flow control of photo-polymerizable resin, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Flow control of photo-polymerizable resin will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2625572

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.