Flow control apparatus for a semiconductor manufacturing wet ben

Ventilation – Workstation ventilator – Covered workbench chamber

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454187, B08B 1502

Patent

active

061528188

ABSTRACT:
Apparatus for controlling the volume of air that is supplied and exhausted from a electronic semiconductor manufacturing wet bench is disclosed. The volume of air that is exhausted from the wet bench is increased during predetermined portions of the manufacturing process and is reduced during noncritical times as a function of predetermined conditions that may be detected or otherwise determined during the manufacturing process.

REFERENCES:
patent: 3728866 (1973-04-01), Layton
patent: 3752056 (1973-08-01), Chamberlin et al.
patent: 3811250 (1974-05-01), Fowler, Jr.
patent: 4377969 (1983-03-01), Nelson
patent: 4466454 (1984-08-01), Layton
patent: 4706553 (1987-11-01), Sharp et al.
patent: 4976815 (1990-12-01), Hiratsuka et al.
patent: 4982605 (1991-01-01), Oram et al.
patent: 5170673 (1992-12-01), Ahmed et al.
patent: 5240455 (1993-08-01), Sharp
patent: 5401212 (1995-03-01), Marvell et al.
patent: 5435779 (1995-07-01), Sharp et al.
patent: 5470275 (1995-11-01), Jacob et al.
patent: 5518446 (1996-05-01), Jacob
patent: 5562537 (1996-10-01), Zver et al.
patent: 5733188 (1998-03-01), Jacob
patent: 5810657 (1998-09-01), Pariseau
patent: 5951394 (1999-09-01), Pariseau
patent: 5990789 (1999-11-01), Berman et al.

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