Ventilation – Workstation ventilator – Covered workbench chamber
Patent
1999-02-10
2000-11-28
Joyce, Harold
Ventilation
Workstation ventilator
Covered workbench chamber
454187, B08B 1502
Patent
active
061528188
ABSTRACT:
Apparatus for controlling the volume of air that is supplied and exhausted from a electronic semiconductor manufacturing wet bench is disclosed. The volume of air that is exhausted from the wet bench is increased during predetermined portions of the manufacturing process and is reduced during noncritical times as a function of predetermined conditions that may be detected or otherwise determined during the manufacturing process.
REFERENCES:
patent: 3728866 (1973-04-01), Layton
patent: 3752056 (1973-08-01), Chamberlin et al.
patent: 3811250 (1974-05-01), Fowler, Jr.
patent: 4377969 (1983-03-01), Nelson
patent: 4466454 (1984-08-01), Layton
patent: 4706553 (1987-11-01), Sharp et al.
patent: 4976815 (1990-12-01), Hiratsuka et al.
patent: 4982605 (1991-01-01), Oram et al.
patent: 5170673 (1992-12-01), Ahmed et al.
patent: 5240455 (1993-08-01), Sharp
patent: 5401212 (1995-03-01), Marvell et al.
patent: 5435779 (1995-07-01), Sharp et al.
patent: 5470275 (1995-11-01), Jacob et al.
patent: 5518446 (1996-05-01), Jacob
patent: 5562537 (1996-10-01), Zver et al.
patent: 5733188 (1998-03-01), Jacob
patent: 5810657 (1998-09-01), Pariseau
patent: 5951394 (1999-09-01), Pariseau
patent: 5990789 (1999-11-01), Berman et al.
Hrkman, Jr. Louis
Jacob Steven D.
Laport Michael
Joyce Andrea M.
Joyce Harold
Siemens Building Technologies Inc.
LandOfFree
Flow control apparatus for a semiconductor manufacturing wet ben does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Flow control apparatus for a semiconductor manufacturing wet ben, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Flow control apparatus for a semiconductor manufacturing wet ben will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1719246