Float zone processing of particulate silicon

Details Float zone processing of particulate silicon Float zone processing of particulate silicon

1991-05-20

1992-04-28

Kunemund, Robert

Chemical apparatus and process disinfecting, deodorizing, preser

Physical type apparatus

Crystallizer

15662073, 15662075, 156DIG64, 156DIG115, 422250, B01D 900

Patent

active

051087200

ABSTRACT:
The present invention is a float-zone process for forming particulate silicon into monocrystalline silicon. The process employs a reusable silicon conduit having a lower end heated to form a melt zone and an upper end provided with a means for delivering a controlled amount of particulate silicon to the melt zone. A monocrystal silicon seed is used to pull a monocrystalline silicon ingot from the melt zone and particulate silicon is added to the melt zone to replenish silicon removed as monocrystalline silicon.

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patent: 3156533 (1964-11-01), Imber
patent: 3293001 (1966-12-01), Spielmann et al.
patent: 3442622 (1969-05-01), Monnier et al.
patent: 4207360 (1980-06-01), Padovani
patent: 4868013 (1989-09-01), Allen

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