Etching a substrate: processes – Forming or treating electrical conductor article – Forming or treating of groove or through hole
Patent
1997-04-02
1999-05-18
Breneman, R. Bruce
Etching a substrate: processes
Forming or treating electrical conductor article
Forming or treating of groove or through hole
216 13, 216 95, 216105, 216100, 252 795, 438754, H01B13/00
Patent
active
059048590
ABSTRACT:
The specification describes techniques for applying under bump metallization (UBM) for solder bump interconnections on interconnection substrates. The UBM of the invention comprises a Cu, Cu/Cr, Cr multilayer structure. Problems in etching the Cu/Cr layer are overcome using a high pH etchant containing a copper complexing ingredient to prevent passivation of the copper constituent by the chromium etchant solution. With the availability of this etchant the UBM multilayer can be formed using subtractive techniques.
REFERENCES:
patent: 3809588 (1974-05-01), Zeblisky
patent: 4396900 (1983-08-01), Hall
patent: 4434434 (1984-02-01), Bhattacharya et al.
patent: 4747907 (1988-05-01), Acocella et al.
patent: 5503286 (1996-04-01), Nye, III et al.
Ahmed Shamim
Breneman R. Bruce
Lucent Technologies - Inc.
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