Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
Reexamination Certificate
2011-06-21
2011-06-21
Le, Thao P. (Department: 2818)
Semiconductor device manufacturing: process
Chemical etching
Combined with the removal of material by nonchemical means
C257SE21242
Reexamination Certificate
active
07964507
ABSTRACT:
A method of manufacturing an electronic device (10) provides a substrate (20) that has a plastic material. A particulate material (16) is embedded in at least one surface of the substrate. A layer of thin-film semiconductor material is deposited onto the substrate (20).
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Kerr Roger S.
Tredwell Timothy J.
Blish Nelson Adrian
Eastman Kodak Company
Le Thao P.
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