Flexible photosensitive polymer composition with azide and/or am

Details Flexible photosensitive polymer composition with azide and/or am Flexible photosensitive polymer composition with azide and/or am

1984-02-08

1986-05-06

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430194, 430197, 430167, 430308, 430325, 430330, 430919, 430927, G03C 171, G03C 160

Patent

active

045871973

ABSTRACT:
A photosensitive polymer composition comprising (A) a poly(amic acid), (B) a compound or a mixture of compounds which can form a compound having two or more amino groups in the molecule, and (C) at least one compound having a boiling point of 150.degree. C. or higher at atmospheric pressure and selected from the group consisting of ##STR1## wherein R.sup.a, R.sup.b, R.sup.c, m and n are as defined in the specification, has good properties and does not produce cracks on a pattern at the time of development obtained from said composition.

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patent: 4216019 (1980-08-01), Reed et al.
patent: 4254197 (1981-03-01), Miura et al.
patent: 4268601 (1981-05-01), Namiki et al.
patent: 4356247 (1982-10-01), Aotani et al.
patent: 4451551 (1984-05-01), Kataoka et al.

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