Flexible nano-imprint stamp

Plastic article or earthenware shaping or treating: apparatus – Preform reshaping or resizing means: or vulcanizing means... – Surface deformation means only

Reexamination Certificate

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Details

C264S293000

Reexamination Certificate

active

08075298

ABSTRACT:
The present invention relates to a nano-imprinting stamp for imprinting nanometer-sized to mm-sized structures, the stamp (1) having a base part and a first and a second imprinting section (2,3), the first and second imprinting sections having a lithographic pattern (7) intended for imprinting in a receiving substrate. In a first aspect, the first and the second imprinting sections (2,3) are independently displaceable in a direction substantially parallel to an imprinting direction of the imprinting stamp. In a second aspect, the first and the second imprinting sections (2,3) are mechanically weakly coupled in a direction substantially parallel to an imprinting direction of the imprinting stamp. The stamp limits the effect of imperfections in or on the substrate to be imprinted with a lithographic pattern (7) and imperfections in or on the stamp and any combinations of such imperfections by localising the bending of the stamp to the base part (5) in-between the imprinting sections (2,3).

REFERENCES:
patent: 5817242 (1998-10-01), Biebuyck et al.
patent: 6365059 (2002-04-01), Perchenik
patent: 6743368 (2004-06-01), Lee
patent: 2002/0132482 (2002-09-01), Chou
patent: 2003/0017424 (2003-01-01), Park et al.
patent: 2005/0178280 (2005-08-01), Lee et al.
U. Plachetka et al., “Wafer scale patterning by soft UV-Nanoimprint Lithography”, Microelectronic Engineering 73-74 (2004) 167-171.
Dahl-Young Khang et al., “Low-Pressure Nanoimprint Lithography”, NANO Letters 2004, vol. 4, No. 4, pp. 633-637.

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