Flexible continuous cathode contact circuit for electrolytic pla

Details Flexible continuous cathode contact circuit for electrolytic pla Flexible continuous cathode contact circuit for electrolytic pla

1997-10-17

1999-02-16

Bell, Bruce F.

Chemistry: electrical and wave energy

Apparatus

Electrolytic

204297M, C25D 1704

Patent

active

058716262

ABSTRACT:
A cathode contact device is provided for providing particle deposition from an anode source onto a target surface of a working piece. The working piece has a first electrically conductive continuous contact surrounding the target surface. The cathode contact device includes a second electrically conductive continuous contact adapted for frictionally contacting the first contact along a continuous path located on the first contact. The second contact further has an inner periphery defining an aperture for passing therethrough the particles onto the target surface. Additionally, the cathode contact device includes a circuit for electrically coupling the second contact to an electrical current supply.

REFERENCES:
patent: 4500394 (1985-02-01), Rizzo
patent: 5516416 (1996-05-01), Canaperi et al.

Affiliated with

Also associated with

Rating

Flexible continuous cathode contact circuit for electrolytic pla does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Flexible continuous cathode contact circuit for electrolytic pla, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Flexible continuous cathode contact circuit for electrolytic pla will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2059061