Chemistry: electrical and wave energy – Apparatus – Electrolytic
Patent
1995-09-27
1998-09-15
Niebling, John
Chemistry: electrical and wave energy
Apparatus
Electrolytic
204297R, C25D 1704
Patent
active
058074694
ABSTRACT:
A cathode contact device is provided for providing particle deposition from an anode source onto a target surface of a working piece. The working piece has a first electrically conductive continuous contact surrounding the target surface. The cathode contact device includes a second electrically conductive continuous contact adapted for frictionally contacting the first contact along a continuous path located on the first contact. The second contact further has an inner periphery defining an aperture for passing therethrough the particles onto the target surface. Additionally, the cathode contact device includes a circuit for electrically coupling the second contact to an electrical current supply.
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V. Murali, A. Bhansali, D. Crafts, I. Carpio, T. Rucker, and T. Workman, C4--A High Performance Interconnect Technology for CPU Applications, AITD, Intel Corporation, Santa Clara, California.
Crafts Douglas E.
Ishida Hirofumi
Swain Steven M.
Takahashi Kenji
Intel Corporation
Mee Brendan
Niebling John
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