Flatness measuring device

Electricity: measuring and testing – Determining nonelectric properties by measuring electric... – Semiconductors for nonelectrical property

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

324 61P, G01N 2700

Patent

active

044917872

ABSTRACT:
A device for measuring a flatness of a plate such as a silicon wafer, a GGG wafer, a printed circuit board, a ceramic substrate, or the like. The measuring device is provided with a disc which is disposed in parallel with the plate on one of the surfaces of the plate and is driven by a rotating drive source and a plurality of detectors for detecting a distance from the detector to the surface of the plate, the detectors being disposed on the surface closer to the disc. With this arrangement, distance data from the plurality of the detectors to the surface of the plate is obtained during the course of the rotation of the disc, and a flatness of the plate is measured.

REFERENCES:
patent: 2217435 (1938-05-01), Edler
patent: 3611120 (1971-10-01), Forster
patent: 3679972 (1972-07-01), Michelson
Wafer Scan II, ADE Corp., Bulletin 383A, 1978

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Flatness measuring device does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Flatness measuring device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Flatness measuring device will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-579038

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.