Radiation imagery chemistry: process – composition – or product th – Plural exposure steps
Reexamination Certificate
2007-03-02
2010-12-14
Duda, Kathleen (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Plural exposure steps
C430S322000
Reexamination Certificate
active
07851141
ABSTRACT:
A method includes exposing a photo-resist layer using a first exposure machine that has a first resolution to cause the photo-resist layer to have an exposed portion and an un-exposed portion. The photo-resist layer is exposed using a second exposure machine that has a second resolution to further expose the un-exposed portion of the photo-resist layer, the first resolution being different from the second resolution.
REFERENCES:
patent: 6187486 (2001-02-01), Lai et al.
patent: 2003/0198787 (2003-10-01), Kwan
patent: 2005/0024549 (2005-02-01), Gotoh et al.
patent: 2005/0213070 (2005-09-01), Scharnweber
patent: 2008/0085471 (2008-04-01), Anderson et al.
Chimei Innolux Corporation
Duda Kathleen
Fish & Richardson P.C.
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