Electrolysis: processes – compositions used therein – and methods – Electrolytic coating – Coating selected area
Patent
1995-06-05
1996-09-17
Niebling, John
Electrolysis: processes, compositions used therein, and methods
Electrolytic coating
Coating selected area
205123, 205157, 205205, 205210, 205219, 205915, 205640, 205666, 216 79, 216 99, C25D 502, C25D 712, C25D 534, C25D 904
Patent
active
055565301
ABSTRACT:
An array of electrodes for use in a flat panel display includes a plurality of electron emitters formed of polycrystalline or single crystalline silicon which has been selectively etched to form pores in the emitters. The electrode array is then electroplated in a methane plasma to deposit a carbon compound such as silicon carbide on the surfaces of the emitters and in the pores of the emitters. Each emitter has a generally flat electron emitting surface which facilitates a longer life for the electrode array, the porous structure of the emitters increasing the electron emission efficiency of the emitters in relatively low electric fields. The electrode array can be integral with a support substrate by anisotropically etching the substrate to form the emitters. A layered interconnect structure can be formed on a surface of the silicon substrate for providing the interconnect structure for the electrode array.
REFERENCES:
patent: 3863332 (1975-02-01), Leupp et al.
patent: 4028149 (1977-06-01), Deines et al.
patent: 5285078 (1994-02-01), Mimura et al.
Hawley's Condensed Chemical Dictionary no month (1987), p. 458.
Finkelstein Walter
Hall John H.
Finklestein Walter J.
Niebling John
Wong Edna
Woodward Henry K.
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