Flat panel display device with anti-reflection layer having...

Details Flat panel display device with anti-reflection layer having... Flat panel display device with anti-reflection layer having...

2005-06-07

2005-06-07

Zarneke, David A. (Department: 2829)

Semiconductor device manufacturing: process

Making device or circuit emissive of nonelectrical signal

Including integrally formed optical element

Reexamination Certificate

active

06902943

ABSTRACT:
A flat panel display includes a conductive layer having a transparent conductive material and a metallic material. The conductive layer has a gradual concentration gradient and is used as a pixel electrode and a black matrix at the same time. A fabrication method of the flat panel display includes forming a thin film transistor equipped with source/drain electrodes on a substrate, forming an insulation layer on the substrate having the thin film transistor, forming a via hole which exposes one of the source/drain electrodes, and forming an anti-reflection layer connected to the exposed one of the source/drain electrode. The anti-reflection layer functions as a pixel electrode and a black matrix of the flat panel display.

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U.S. Appl. No. 10/288,509, filed Nov. 6, 2002, Dong-Chan Shin et al., Samsung SDI Co., Ltd.
U.S. Appl. No. 10/288,486, filed Nov. 6, 2002, Jae-Bon Koo et al., Samsung SDI Co., Ltd.

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