Radiation imagery chemistry: process – composition – or product th – Producing cathode-ray tube or element thereof – With faceplate of phosphoric stripes
Patent
1996-05-02
1997-12-16
Angebranndt, Martin
Radiation imagery chemistry: process, composition, or product th
Producing cathode-ray tube or element thereof
With faceplate of phosphoric stripes
430 23, 430320, 430321, 430323, 427585, 427 64, 427 66, 427 68, 313582, 313586, 313587, H01J 1100, H05B 3212
Patent
active
056983530
DESCRIPTION:
BRIEF SUMMARY
FIELD OF THE INVENTION
This invention relates to a flat display and method of its manufacture, and more particularly to a flat display combining an electro luminescent display and a plasma display panel.
BACKGROUND OF THE INVENTION
Generally, an electro luminescent display(ELD) is very likely to a plasma display panel(PDP) using a gas discharge in the light of its structure and drive method except that it has a luminescent layer which emit light by electric filed formed between an anode and a cathode, wherein the luminescent layer is formed by solid state, so the ELD can easily manufacture in thinner thickness than that of the PDP caused by adopting such a luminescent means formed by solid state.
Such a ELD or PDP have need of three color, i.e., blue, green and red, to display a color picture, however, in case of the ELD, luminescent materials to emit green and red light can obtain a desired brightness while luminescent materials to emit blue light can not obtain a desired brightness, so it is difficult to display a color picture by the ELD, and in case of the PDP, it is possible to display a color picture but it has a defect in that a fine processing to accomplish a high density color picture is difficult.
Therefore, it is the object of the present invention to provide a flat display and method of its manufacture which can solve the above problems by combining a plasma display panel and a luminescent panel.
SUMMARY OF THE INVENTION
To achieve the above object, a flat display according to the present invention, comprises: display panel 30 which is combined to the electro luminescent display 20.
A method of manufacturing a flat display according to the present invention, comprises the steps of: a first insulating layer 3 on a resulting structure after forming the first transparent electrode and forming a red luminescent pattern 5 and a green luminescent pattern 4 on the first insulating layer 3 and then forming a second transparent electrode 7 on a resulting structure after forming the red and green luminescent patterns; forming a strong insulating layer 8 and protecting layer 14 on the second transparent electrode, thereby forming an electro luminescent display; forming a metal electrode pattern 10 on a second glass substrate; forming a blue luminescent layer 11 on a resulting structure after forming the metal glass substrate; forming a column partition 12 and a row partition 13 to form a discharge space on the blue luminescent layer 11, thereby forming a plasma display panel 30; and sealing the electro luminescent display 20 to the plasma display panel 30 by a sealing member 15 and injecting a penning gas in the discharge space 16.
BRIEF DESCRIPTION OF THE DRAWINGS
FIG. 1 through FIG. 6 are sectional views illustrating a method of manufacturing a flat display according to the invention.
FIG. 7 illustrates a flat display panel according to the invention.
DETAILED DESCRIPTION OF THE INVENTION
Below, this invention will be described in detail with reference to accompanying drawings.
FIG. 1 through FIG. 6 are sectional views illustrating a method of manufacturing a flat display according to the invention.
Referring to FIG.1 indium tin oxide(ITO) is coated on a first glass substrate 1 and the ITO is then patterned by a photolithography process, thereby forming a plurality of transparent electrodes 2 as shown in FIG. 2.
To performing the above patterning process, the indium tin oxide coated the first glass substrate 1 is cleaned and a photoresist is then coated on the indium tin oxide and a photoresist soft baking process is performed. A mask is arranged on the photoresist and a selected portion of the photoresist is exposed to the light by means of a development process and the mask is removed and exposed portions of the photoresist are then removed, thereby forming a photoresist pattern. After the photoresist pattern is formed, a hard baking process is performed and exposed portions of the ITO are etched using the photoresist pattern as a mask and the photoresist pattern is then removed, thereby
REFERENCES:
patent: 3836393 (1974-09-01), Ersthausen et al.
patent: 4977350 (1990-12-01), Tanaka et al.
patent: 5164799 (1992-11-01), Uno
patent: 5432015 (1995-07-01), Wu et al.
Angebranndt Martin
Orion Electric Company Ltd.
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