Flame sampling apparatus and method

Details Flame sampling apparatus and method Flame sampling apparatus and method

1980-02-14

1981-07-14

Serwin, Ronald

Chemistry: physical processes

Physical processes

Crystallization

422 54, 422 80, G01N 2172

Patent

active

042784417

ABSTRACT:
A mass spectrometer is employed to analyze the boron and phosphorus content in silicon or a silicon compound such as SiH.sub.4 or SiHCl.sub.3. According to the preferred embodiment a first non-seeded flame is surrounded by a second seeded flame. The velocities of both flames are approximately the same so that the boundary between them is relatively stable. Small quantities of BO.sub.2.sup.- and PO.sub.2.sup.- are formed in the second flame seeded with a silicon compound. The positively charged inlet orifice of a mass spectrometer is placed in the first flame sufficiently close to the boundary so as to attract negative ions into the instrument. In this manner the relatively small orifice of the sampling cone is not plugged by the SiO.sub.2 particles that are generated in the outer flame and the boron and phosphorus content of the silicon or silicon compound can be measured.

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patent: 4097239 (1978-06-01), Patterson
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