Flame ashing process for stripping photoresist

Details Flame ashing process for stripping photoresist Flame ashing process for stripping photoresist

1988-01-25

1989-07-04

Hearn, Brian E.

Fishing, trapping, and vermin destroying

427224, 427271, 148DIG137, 437247, H01L 2147, H01L 21312

Patent

active

048450537

ABSTRACT:
Process and apparatus employing flame ashing for stripping photoresist from a substrate in the manufacture of a semiconductor device. The substrate is exposed to the flame with the photoresist to be removed being contacted directly by the flame to oxidize, or ash, the photoresist. The flame is produced by burning oxygen and a gaseous fuel, and the rate of ashing is increased by preheating the substrate. Nitrogen, a nitrogen-containing gas or an inert gas is added to the fuel to provide a cooler flame and an improved ashing rate. In one disclosed embodiment, the oxygen and the gaseous fuel are discharged through a plurality of spaced apart openings in a burner and the substrate is moved relative to the frames to successively ash different portions of the photoresist.

REFERENCES:
patent: 4241165 (1980-12-01), Hughes et al.
patent: 4296146 (1981-10-01), Penn
patent: 4341592 (1975-08-01), Shortes et al.
patent: 4374699 (1983-02-01), Sanders et al.
patent: 4631250 (1986-12-01), Hayashi

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