Heating – Work chamber having heating means – Having means by which work is progressed or moved mechanically
Patent
1989-03-07
1990-06-26
Yuen, Henry C.
Heating
Work chamber having heating means
Having means by which work is progressed or moved mechanically
432222, 432 10, F26B 328, F27B 900
Patent
active
049367722
ABSTRACT:
Process and apparatus employing flame ashing for stripping photoresist from a substrate in the manufacture of a semiconductor device. The substrate is exposed to the flame with the photoresist to be removed being contacted directly by the flame to oxidize, or ash, the photoresist. The flame is produced by burning oxygen and a gaseous fuel, and the rate of ashing is increased by preheating the substrate. Nitrogen, a nitrogen-containing gas or an inert gas is added to the fuel to provide a cooler flame and an improved ashing rate. In one disclosed embodiment, the oxygen and the gaseous fuel are discharged through a plurality of spaced apart openings in a burner and the substrate is moved relative to the flames to successively ash different portions of the photoresist.
REFERENCES:
patent: 3280428 (1966-10-01), Watts, Jr.
patent: 3879164 (1975-04-01), Haldopoulus et al.
patent: 4241165 (1980-12-01), Hughes et al.
patent: 4296146 (1981-10-01), Penn
patent: 4341592 (1982-07-01), Shortes et al.
patent: 4374699 (1983-02-01), Sanders et al.
patent: 4432727 (1984-02-01), Fraioli
patent: 4507083 (1985-03-01), Fraioli
patent: 4549866 (1985-10-01), Granville
patent: 4555273 (1985-11-01), Collins et al.
patent: 4631250 (1986-12-01), Hayashi
patent: 4652236 (1987-03-01), Viesmann
LandOfFree
Flame ashing process and apparatus for stripping photoresist does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Flame ashing process and apparatus for stripping photoresist, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Flame ashing process and apparatus for stripping photoresist will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1122793