Fixture for VPE reactor

Details Fixture for VPE reactor Fixture for VPE reactor

1981-03-13

1982-12-28

Smith, John D.

Coating apparatus

Gas or vapor deposition

Work support

118500, 118729, 156611, C23C 1100

Patent

active

043655882

ABSTRACT:
A fixture for use within an epitaxial deposition reactor includes a box adapted to receive a semiconductor substrate. The box is movable to a position of reactant gas flow within the reactor and it includes a porous cover. A stagnant mixture of reactant gases is maintained between the substrate and the cover while the box is within the zone of reactant gas flow.

REFERENCES:
patent: 3316130 (1967-04-01), Dash et al.
patent: 3394390 (1968-07-01), Cheney
patent: 3603284 (1971-09-01), Garnache
patent: 3617371 (1971-11-01), Burmeister, Jr.
patent: 3701682 (1972-07-01), Gartman et al.
patent: 3901746 (1975-08-01), Boucher
patent: 4129090 (1978-12-01), Inahiwa et al.
patent: 4256053 (1981-03-01), Dozier

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