X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent
1985-04-23
1987-02-03
Church, Craig E.
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
378 70, 378 71, 378 73, 378 74, 378 81, G01N 2320
Patent
active
046413294
ABSTRACT:
A fixture is provided for supporting and aligning small samples of material on a goniometer for X-ray diffraction analysis. A sample-containing capillary is accurately positioned for rotation in the X-ray beam by selectively adjusting the fixture to position the capillary relative to the x and y axes thereof to prevent wobble and position the sample along the z axis or the axis of rotation. By employing the subject fixture relatively small samples of materials can be analyzed in an X-ray diffraction apparatus previously limited to the analysis of much larger samples.
REFERENCES:
patent: 2431282 (1947-11-01), Speed
patent: 2445132 (1948-07-01), Berman
patent: 3536912 (1970-10-01), Speck et al.
patent: 3600576 (1971-08-01), Carter et al.
Green Lanny A.
Heck, Jr. Joaquim L.
Church Craig E.
Freeman John C.
Hamel Stephen D.
Hightower Judson R.
Larcher Earl L.
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