Abrading – Abrading process – Glass or stone abrading
Patent
1997-08-22
1999-07-06
Morgan, Eileen P.
Abrading
Abrading process
Glass or stone abrading
451285, 451287, 451529, B24B 700
Patent
active
059190825
ABSTRACT:
Apparatuses and methods are disclosed using a fixed abrasive polishing pad to perform mechanical polishing of a surface. The apparatus includes a polishing pad positioned opposing a wafer support to provide for polishing of a surface of a wafer placed on the support. The polishing pad includes a first member having a first polishing surface formed from an abrasive first material that is structurally degradable during polishing. The polishing pad also includes a second member having a second polishing surface formed from a second material that is less degradable and less abrasive relative to said first material. The first and second polishing surfaces define a polishing face that is brought into contact with the surface to be polished. Preferably, a portion of the second member can be removed from the polishing pad so that the first polishing surface extends beyond the second polishing surface to provide for a fixed amount of abrasion using the first member prior to the second member contacting the surface and substantially reducing or stopping the polishing process.
REFERENCES:
patent: 5287663 (1994-02-01), Pierce et al.
patent: 5356513 (1994-10-01), Burke et al.
patent: 5421769 (1995-06-01), Schultz et al.
patent: 5435772 (1995-07-01), Yu
patent: 5441598 (1995-08-01), Yu et al.
patent: 5453312 (1995-09-01), Haas et al.
patent: 5468682 (1995-11-01), Homma
patent: 5503592 (1996-04-01), Neumann
patent: 5510652 (1996-04-01), Burke et al.
patent: 5516400 (1996-05-01), Pasch et al.
patent: 5516729 (1996-05-01), Dawson et al.
patent: 5525191 (1996-06-01), Maniar et al.
patent: 5527424 (1996-06-01), Mullins
patent: 5624303 (1997-04-01), Robinson
patent: 5725417 (1998-03-01), Robinson
patent: 5738567 (1998-04-01), Manzonie et al.
Robinson Karl M.
Walker Michael A.
Micro)n Technology, Inc.
Morgan Eileen P.
LandOfFree
Fixed abrasive polishing pad does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Fixed abrasive polishing pad, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Fixed abrasive polishing pad will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-895092