Fixed-abrasive chemical-mechanical planarization of titanium...

Details Fixed-abrasive chemical-mechanical planarization of titanium... Fixed-abrasive chemical-mechanical planarization of titanium...

2008-07-22

2008-07-22

Rachuba, Maurina (Department: 3723)

Abrading

Abrading process

Glass or stone abrading

C451S060000, C051S293000

Reexamination Certificate

active

07402094

ABSTRACT:
Planarizing solutions, and their methods of use, for removing titanium nitride from the surface of a substrate using a fixed-abrasive planarizing pad. The planarizing solutions take the form of an etchant solution or an oxidizing solution. The etchant solutions are aqueous solutions containing an etchant and a buffer. The etchant contains one or more etching agents selective to titanium nitride. The oxidizing solutions are aqueous solutions containing an oxidizer and a buffer. The oxidizer contains one or more oxidizing agents selective to titanium nitride. In either solution, i.e., etchant or oxidizing solution, the buffer contains one or more buffering agents. Titanium nitride layers planarized in accordance with the invention may be utilized in the production of integrated circuits, and various apparatus utilizing such integrated circuits.

REFERENCES:
patent: 3097083 (1963-07-01), Silvernail
patent: 3755147 (1973-08-01), Michelson et al.
patent: RE31395 (1983-09-01), Rooney
patent: 4522928 (1985-06-01), McVicker et al.
patent: 4606996 (1986-08-01), Nakamura et al.
patent: 4672482 (1987-06-01), Troletti
patent: 4764498 (1988-08-01), Wissner et al.
patent: 4897709 (1990-01-01), Yokoyama et al.
patent: 4954142 (1990-09-01), Carr et al.
patent: 5084071 (1992-01-01), Nenadic et al.
patent: 5210047 (1993-05-01), Woo et al.
patent: 5232875 (1993-08-01), Tuttle et al.
patent: 5273871 (1993-12-01), Takada et al.
patent: 5335453 (1994-08-01), Baldy et al.
patent: 5340370 (1994-08-01), Cadien et al.
patent: 5372673 (1994-12-01), Stager et al.
patent: 5381302 (1995-01-01), Sandhu et al.
patent: 5476413 (1995-12-01), Hasegawa et al.
patent: 5516346 (1996-05-01), Cadien et al.
patent: 5596226 (1997-01-01), Beilstein et al.
patent: 5603654 (1997-02-01), Hayashi
patent: 5624303 (1997-04-01), Robinson
patent: 5692950 (1997-12-01), Rutherford et al.
patent: 5700383 (1997-12-01), Feller et al.
patent: 5725417 (1998-03-01), Robinson
patent: 5733176 (1998-03-01), Robinson et al.
patent: 5756403 (1998-05-01), Tijburg et al.
patent: 5782675 (1998-07-01), Southwick
patent: 5783489 (1998-07-01), Kaufman et al.
patent: 5810964 (1998-09-01), Shiraishi
patent: 5836806 (1998-11-01), Cadien et al.
patent: 5858813 (1999-01-01), Scherber et al.
patent: 5861055 (1999-01-01), Allman et al.
patent: 5863838 (1999-01-01), Farkas et al.
patent: 5866031 (1999-02-01), Carpio et al.
patent: 5869392 (1999-02-01), Kimura
patent: 5916855 (1999-06-01), Avanzino et al.
patent: 5954997 (1999-09-01), Kaufman et al.
patent: 5958288 (1999-09-01), Mueller et al.
patent: 5972792 (1999-10-01), Hudson
patent: 5976284 (1999-11-01), Calvert et al.
patent: 5993685 (1999-11-01), Currie et al.
patent: 5998244 (1999-12-01), Wolstenholme et al.
patent: 6001269 (1999-12-01), Sethuraman et al.
patent: 6033596 (2000-03-01), Kaufman et al.
patent: 6066528 (2000-05-01), Fazan et al.
patent: 6080709 (2000-06-01), Ishikawa et al.
patent: 6117775 (2000-09-01), Kondo et al.
patent: 6117783 (2000-09-01), Small et al.
patent: 6126989 (2000-10-01), Robinson et al.
patent: 6136711 (2000-10-01), Grumbine et al.
patent: 6159083 (2000-12-01), Appel et al.
patent: 6194317 (2001-02-01), Kaisaki et al.
patent: 6204169 (2001-03-01), Bajaj et al.
patent: 6217416 (2001-04-01), Kaufman et al.
patent: 6218306 (2001-04-01), Fishkin et al.
patent: 6235071 (2001-05-01), Tsuchiya et al.
patent: 6238592 (2001-05-01), Hardy et al.
patent: 6265781 (2001-07-01), Andreas
patent: 6281143 (2001-08-01), Huang et al.
patent: 6346144 (2002-02-01), Lee
patent: 6413868 (2002-07-01), Bartush et al.
patent: 6419554 (2002-07-01), Chopra et al.
patent: 6432828 (2002-08-01), Kaufman et al.
patent: 6451692 (2002-09-01), Derderian et al.
patent: 6488575 (2002-12-01), Agarwal et al.
patent: 6584509 (2003-06-01), Putzolu
patent: 6593239 (2003-07-01), Kaufman et al.
patent: 6620037 (2003-09-01), Kaufman et al.
patent: 6635186 (2003-10-01), Small et al.
patent: 6676484 (2004-01-01), Chopra
patent: 6881129 (2005-04-01), Chopra et al.
patent: 6997781 (2006-02-01), Chopra et al.
patent: 2004/0134873 (2004-07-01), Yao et al.
patent: 2005/0199588 (2005-09-01), Chopra et al.
patent: 2006/0003675 (2006-01-01), Chopra et al.
patent: 2006/0009136 (2006-01-01), Chopra et al.
Printout of MSDS Material Safety Data Sheet from Mallinckrodt Baker, Inc. 222 Red School Lane, Phillipeburg, NJ 08865 titled “Ascorbic Acid”.

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