Fingerprint recognition sensor and manufacturing method thereof

Television – Camera – system and detail – Solid-state image sensor

Reexamination Certificate

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C382S124000, C250S297000

Reexamination Certificate

active

09738986

ABSTRACT:
A method for manufacturing a fingerprint recognition sensor is provided. The method includes providing a CMOS sensor; depositing a transparent electrode layer as a thin film on the upper portion of the CMOS image sensor, to which a terminal of an AC power source is connected, the transparent electrode layer being made of a transparent insulating material and a transparent conductive material; forming a luminescent layer at the upper portion of the transparent electrode layer to generate a light image; forming a dielectric layer at the upper portion of the luminescent layer; and forming a contamination-resistance film at the upper portion of the dielectric layer. With this method, since the CMOS image sensor is utilized, circuit construction can be simplified. In addition, a fingerprint image having a good contrast can be obtained.

REFERENCES:
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patent: 6011859 (2000-01-01), Kalnitsky et al.
patent: 6091838 (2000-07-01), Burrows et al.
patent: 6219793 (2001-04-01), Li et al.
patent: 6326644 (2001-12-01), Lee et al.
patent: 6628377 (2003-09-01), Sabatini et al.

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