Finely, divided, precipitated silica with high structure, method

Details Finely, divided, precipitated silica with high structure, method Finely, divided, precipitated silica with high structure, method

1990-06-22

1991-07-23

Chaudhuri, Olik

Chemistry of inorganic compounds

Silicon or compound thereof

Oxygen containing

C01B 3318

Patent

active

050342070

ABSTRACT:
Finely divided precipitated silica for use as a delustering agent with high structure and a

REFERENCES:
patent: 4001379 (1977-01-01), Turk et al.
patent: 4179431 (1979-12-01), Kilian et al.
patent: 4332600 (1982-01-01), Wegerhoff et al.
patent: 4495167 (1985-01-01), Nauroth et al.

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