Finely controlled semiconductor device and method of manufacturi

Fishing – trapping – and vermin destroying

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437911, H01L 21332

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052486222

ABSTRACT:
A semiconductor device includes a substrate of a first conductivity type. A first layer of a second conductivity type is formed on one surface of the substrate of the first conductivity type. A second layer of the first conductivity type is formed on the first layer of the second conductivity type. A third layer of the first conductivity type is selectively formed on the other surface of the substrate of the first conductivity type. A fourth layer of the second conductivity type is formed on the other surface of the substrate of the first conductivity type. The vertical dimension of the fourth layer falls within a range of 5 to 20 .mu.m and is smaller than that of the first layer.

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Patent Abstracts of Japan, vol. 12, No. 489 (E-698) [3345], Dec. 26, 1988.
Patent Abstracts of Japan, vol. 9, No. 230 (E-343) [1953], Sep. 17, 1985.
Patent Abstracts of Japan, vol. 6, No. 60 (E-102) [938]Apr. 17, 1982.

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