Fine screen and fine screen stack, their use and process for the

Details Fine screen and fine screen stack, their use and process for the Fine screen and fine screen stack, their use and process for the

1984-09-10

1987-04-07

Spitzer, Robert

Gas separation

Means within gas stream for conducting concentrate to collector

55 97, 55158, 55524, 55525, 4232135, 427 39, 427245, 427405, B01D 5322

Patent

active

046557970

ABSTRACT:
A fine mesh screen is coated with at least one metal, by galvanic or chemical deposition. Metals of the platinum group are especially advantageous. The mesh width may be as small as 0.1 micron or less. Several screens may be arranged in a stack and used to clean waste gases.

REFERENCES:
patent: 2425235 (1947-08-01), Ferrante
patent: 2747679 (1956-05-01), Ruthardt
patent: 3010536 (1961-11-01), Plurien et al.
patent: 3189563 (1965-06-01), Hauel
patent: 3719739 (1973-03-01), Thompson
patent: 3842159 (1974-10-01), Niebylski et al.
patent: 3849342 (1974-11-01), Santala
patent: 3857680 (1974-12-01), Porta et al.
patent: 3886095 (1975-05-01), Ford et al.
patent: 3944504 (1976-03-01), Ford et al.
patent: 3966645 (1976-06-01), Cairns et al.
patent: 3969480 (1976-07-01), Fedor et al.
patent: 4169911 (1979-10-01), Yoshida et al.
patent: 4271044 (1981-06-01), Fratzer et al.
patent: 4426320 (1984-01-01), Ernest et al.
patent: 4428756 (1984-01-01), Iniotakis
patent: 4511539 (1985-04-01), Stephenson
Klante, Von G., "Olhydraulik-Filterelemente", Olhydraulik, No. 14, technica 965, pp. 1237-1239.

Affiliated with

Also associated with

Rating

Fine screen and fine screen stack, their use and process for the does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Fine screen and fine screen stack, their use and process for the, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Fine screen and fine screen stack, their use and process for the will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1084467