Fine resistance adjustment for polysilicon

Coded data generation or conversion – Analog to or from digital conversion – Digital to analog conversion

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C341S144000, C341S145000

Reexamination Certificate

active

08031100

ABSTRACT:
A resistor string digital to analog converter formed of polysilicon resistor segments to each of which is applied an electric field. The approach improves the overall accuracy.

REFERENCES:
patent: 4164668 (1979-08-01), Delaporte et al.
patent: 4210996 (1980-07-01), Amemiya et al.
patent: 4311988 (1982-01-01), Kelley et al.
patent: 4868482 (1989-09-01), O'Shaughnessy et al.
patent: 5108945 (1992-04-01), Matthews
patent: 5329155 (1994-07-01), Lao et al.
patent: 5534862 (1996-07-01), Gross, Jr. et al.
patent: 5554986 (1996-09-01), Neidorff
patent: 5589847 (1996-12-01), Lewis
patent: 5751050 (1998-05-01), Ishikawa et al.
patent: 6529152 (2003-03-01), Piasecki et al.
patent: 7112535 (2006-09-01), Coolbaugh et al.
patent: 7119656 (2006-10-01), Landsberger et al.
patent: 7461285 (2008-12-01), Nervegna
patent: 7616089 (2009-11-01), Yang et al.
patent: 2002/0186158 (2002-12-01), Leung
patent: 2009/0002120 (2009-01-01), Molin et al.
patent: 2009/0267727 (2009-10-01), Ashikaga
Bryant, J., et al., “Data Converter Architectures,” Analog-Digital Conversion, Chapter 3, Section 3.1: DAC Architectures, pp. 3.1-3.38.
O'Dwyer, T.G., et al., “An Enhanced Model for Thin Film Resistor Matching,”IEEE,pp. 45-49 (2009).
Tian, W., et al., “Mismatch Characterization of a High Precision Resistor Array Test Structure,”IEEEConference on Microelectronic Test Structures, pp. 1-6 (Mar. 24-27, 2008).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Fine resistance adjustment for polysilicon does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Fine resistance adjustment for polysilicon, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Fine resistance adjustment for polysilicon will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4262083

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.