Fine resist pattern forming method and nanoimprint mold...

Details Fine resist pattern forming method and nanoimprint mold... Fine resist pattern forming method and nanoimprint mold...

2011-04-12

2011-04-12

Johnson, Christina (Department: 1742)

Plastic and nonmetallic article shaping or treating: processes

Direct application of electrical or wave energy to work

Polymerizing, cross-linking, or curing

C977S887000

Reexamination Certificate

active

07922960

ABSTRACT:
A light-transmitting mold structure having a mold pattern corresponding to a portion to form a pattern by nanoimprint and a conductive film pattern corresponding to a portion to form a pattern by nonadiabatic near-field exposure is used to irradiate UV light from a back surface of the mold structure and to perform nonadiabatic near-field light exposure in an imprint process so that all patterns having various sizes for simulating various designs can be faithfully transferred by a single imprint process (imprint & UV exposure).

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Cheng, X., L. Jay Guo, One-step lithography for various size patterns with a hybrid mask-mold, Microelectronic Engineering, vol. 71 (2004), pp. 288-293.

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